The laser patterning process is a dry process that forms the patterns of circuits and elements required for each device. Laser selectively removes various types of functional laminated films formed on a glass substrate or film substrate.
ITO film patterning on glass substrate
Line width: 25μm
ITO film patterning on film
Line width:30μm
Silver paste patterning on film
Line width: 25μm
The system has been widely used for especially electrode formation of transparent films such as ITO, silver nanowire, CNT and silver paste.
A batch-type patterning device equipped with a digital Galvano scanner and a high-precision workpiece positioning stage.
We can handle from production to prototyping in circuit formation for touch panel displays and organic EL devices.
Standard board dimension is 500×500, but we can design it according to your application and size.
Under the best conditions, microfabrication with a width of 10 μm is possible.
Compact and low cost laser patterning system specialized for R&D and preproduction.
It can used for workpieces such as glass or film substrates.
Digital Galvano scanner enables advanced high-accuracy patterning, which is suitable for next-generation development. Standard board dimension is 500×500, but we can design it according to your application.
A laser patterning device for roll-shaped films and long workpieces.
Setting a workpiece on a reeler enables consecutive processing.
In order to realize high-precision and high-speed patterning, the standard mechanism combines a linear drive gantry stage and a digital Galvano scanner. We will select the optimum mechanism, and laser type and wavelength according to your request.